Low-Inductance Antenna (LIA™) plasma 기술과 당사 대형 반송 기술을 대형 기판 대응 CVD 장치에 전개했습니다.
기판에 대한 손상을 줄이면서 고밀도 plasma를 생성하는 LIA™ plasma 기술과, 세계 시장 점유율 No.1의 실적을 가진 디스플레이 제조 장치지 발전된 대형 기판 반송 기술을 조합하여 대형 기판에 대한 고속 균일 처리를 가능하게 하고 있습니다.
1. High deposition rate SiNx 3.0nm/sec. or higher
2. Excellent uniformity ±3% or less (ex. Effective area 1,200mm x 1,000 mm)
3. Deposition-up type
Substrate size : 1,500 mm x 1,850 mm (G6)
▪ 소형의 실험용 장비도 제공 가능합니다.
▪ 매엽식 Sputter 장치 [VS 시리즈]와 인라인으로 구성하는 것도 가능 합니다.
※LIA는 EMD Corporation의 상표 또는 등록상표 입니다.
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